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    • Chinese
      TMAH-2.png
      TMAH-2.png

      Tetramethylammonium hydroxide solution

      Product Name:
      Chemical formula: C4H13NO CAS No.: 75-59-2 EINECS No.: 200-882-9 UN No.: 1835 Purity grade: EL Place of origin: Foshan, China Appearance: Colorless transparent liquid, alcohol-like odor Melting Point: 63℃ Boiling point: 110℃ Density: 1.02 g/cm3

      Application:

      (1) Be used as anisotropic etching of silicon. 

      (2) Be used as a basic solvent in the development of acidic photo resist in the photolithography process,

      (3) Be highly effective in stripping photo resist

      (4) Be used as a surfactant in the synthesis of ferrofluid, to inhibit nanoparticle aggregation.

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